Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle

Vincent, BenjaminBenjaminVincentHathwar, R.R.HathwarKamon, M.M.KamonErvin, J.J.ErvinSchram, TomTomSchramChiarella, ThomasThomasChiarellaDemuynck, StevenStevenDemuynckBaudot, SylvainSylvainBaudotSiew, Yong KongYong KongSiewKubicek, StefanStefanKubicekDentoni Litta, EugenioEugenioDentoni LittaChew, Soon AikSoon AikChewMitard, JeromeJeromeMitard2021-10-292021-10-2920200018-9383https://imec-publications.be/handle/20.500.12860/36274Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicleJournal articlehttps://ieeexplore.ieee.org/document/9222056