Defect density of ultra-thin gate oxides grown by conventional oxidation processes

Depas, MichelMichelDepasVermeire, BertBertVermeireMertens, PaulPaulMertensSchaekers, MarcMarcSchaekersMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/132Defect density of ultra-thin gate oxides grown by conventional oxidation processesProceedings paper