Application of single-wafer wet cleaning prior to epitaxial SiGe process

Sano, Ken-IchiKen-IchiSanoWada, MasayukiMasayukiWadaLeys, FrederikFrederikLeysLoo, RogerRogerLooHikavyy, AndriyAndriyHikavyyMertens, PaulPaulMertensSnow, JimJimSnowIzumi, A.A.IzumiMiya, KatsuhikoKatsuhikoMiyaEitoku, AtsuroAtsuroEitoku2021-10-182021-10-1820091662-9779https://imec-publications.be/handle/20.500.12860/16156Application of single-wafer wet cleaning prior to epitaxial SiGe processJournal article