Kempsell, MonicaMonicaKempsellHendrickx, EricEricHendrickxTritchkov, AlexanderAlexanderTritchkovSakajiri, KyoheiKyoheiSakajiriYasui, KenichiKenichiYasuiYoshitake, SusukiSusukiYoshitakeGranik, YuriYuriGranikVandenberghe, GeertGeertVandenbergheSmith, Bruce W.Bruce W.Smith2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15584Inverse lithography for 45-nm-node contact holes at 1.35 numerical apertureJournal article