Shindo, HiroyukiHiroyukiShindoSugiyama, AkiyukiAkiyukiSugiyamaKomuro, HitoshiHitoshiKomuroHojyo, YutakaYutakaHojyoMatsuoka, RyoichiRyoichiMatsuokaSturtevant, JohnJohnSturtevantDo, ThuyThuyDoKusnadi, IrIrKusnadiFenger, GermainGermainFengerDe Bisschop, PeterPeterDe BisschopVan de Kerkhove, JeroenJeroenVan de Kerkhove2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16218High-precision contouring from SEM image in 32-nm lithography and beyondProceedings paper