Vankerckhoven, HansHansVankerckhovenDe Smedt, FrankFrankDe SmedtVinckier, ChrisChrisVinckierVan Herp, BartBartVan HerpClaes, M.M.ClaesDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5798Removal of photoresist by O3DI water processes: determination of degradation productsMeeting abstract