Leroy, F.F.LeroyTillocher, T.T.TillocherZhang, LipingLipingZhangLefaucheux, P.P.LefaucheuxYatsuda, K.K.YatsudaMaekawa, K.K.Maekawade Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanovDussart, RRDussart2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25530Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damageMeeting abstract