Hermans, JanJanHermansDai, HuixiongHuixiongDaiNiroomand, ArdavanArdavanNiroomandLaidler, DavidDavidLaidlerMao, MingMingMaoChen, YongmeiYongmeiChenLeray, PhilippePhilippeLerayNgai, ChrisChrisNgaiCheng, ShauneeShauneeCheng2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22483Towards manufacturing a 10nm node device with complementary EUV lithographyProceedings paper