Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, HugoHugoBenderConard, ThierryThierryConardRichard, OlivierOlivierRichardBrijs, BertBertBrijsPetry, JasmineJasminePetryVandervorst, WilfriedWilfriedVandervorstDefranoux, C.C.DefranouxBoher, P.P.BoherRochat, N.N.RochatWyon, C.C.WyonMack, P.P.MackWolstenholme, J.J.WolstenholmeVitchev, R.R.VitchevHoussiau, L.L.HoussiauPireaux, J.J.J.J.PireauxBergmaier, A.A.BergmaierDollinger, G.G.Dollinger2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7195Physical characterization of thin HfO2 layers by the combined analysis with complementary techniquesProceedings paper