Developing a full wafer-scale approach towards high ALD selectivity on copper vs low-K (and oxides) using a single ALD/SAMS platform

Lecordier, LaurentLaurentLecordierArmini, SilviaSilviaArminiHerregods, SebastiaanSebastiaanHerregods2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28772Developing a full wafer-scale approach towards high ALD selectivity on copper vs low-K (and oxides) using a single ALD/SAMS platformMeeting abstracthttps://aldconference.avs.org/wp-content/uploads/2017/05/ALD-Tech-Program-4.7-1.pdf