Ali, Ali MohamedAli MohamedAliKrieger, GuillaumeGuillaumeKriegerSoulie, Jean-PhilippeJean-PhilippeSoulieKnoops, Harm C. M.Harm C. M.KnoopsKessels, Wilhelmus M. M.Wilhelmus M. M.KesselsDe Gendt, StefanStefanDe GendtKundu, SouvikSouvikKundude Marneffe, Jean-FrancoisJean-Francoisde Marneffe2026-07-272026-07-2720262637-6113https://imec-publications.be/handle/20.500.12860/60001engAtomic Layer Etching of Nickel Using N<sub>2</sub>/H<sub>2</sub> Plasma Exposure and HexafluoroacetylacetoneJournal article10.1021/acsaelm.5c02655WOS:001750568200001DEPOSITIONH-2N-2MEDLINE:421474082637-6113