Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterning

Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxBaerts, ChristinaChristinaBaertsOnandia, LauraLauraOnandiaVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15588Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterningProceedings paper