Grenville, AndrewAndrewGrenvilleAnderson, Jeremy T.Jeremy T.AndersonClark, Benjamin L.Benjamin L.ClarkDe Schepper, PeterPeterDe SchepperEdson, JosephJosephEdsonGreer, MichaelMichaelGreerKai, JiangJiangKaiKocsis, MichaelMichaelKocsisMeyers, Stephen T.Stephen T.MeyersStowers, Jason K.Jason K.StowersTelecky, Alan J.Alan J.TeleckyDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenberghe2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25339Integrated fab process for metal oxide EUV photoresistProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2241752