Extraction and identification of resist modeling parameters for EUV lithography

Fonseca, CarlosCarlosFonsecaGronheid, RoelRoelGronheidScheer, StevenStevenScheer2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13734Extraction and identification of resist modeling parameters for EUV lithographyProceedings paper