Single-Photon Source Monolithically Integrated on a 300 mm Silicon Wafer Using III-V Nano-ridge Engineering

Colucci, DavideDavideColucciPfister, UlrichUlrichPfisterAlcotte, ReynaldReynaldAlcotteSwekis, PeterPeterSwekisDe Maeyer, MichielMichielDe MaeyerOuyang, ZhongtaoZhongtaoOuyangVandekerckhove, TomTomVandekerckhoveMols, YvesYvesMolsLanger, RobertRobertLangerJetter, MichaelMichaelJetterPortalupi, Simone LucaSimone LucaPortalupiMichler, PeterPeterMichlerPourtois, GeoffreyGeoffreyPourtoisVan Thourhout, DriesDriesVan ThourhoutKunert, BernardetteBernardetteKunert2025-06-242025-06-242025-JUN 12330-4022WOS:001510204200001https://imec-publications.be/handle/20.500.12860/45834Single-Photon Source Monolithically Integrated on a 300 mm Silicon Wafer Using III-V Nano-ridge EngineeringJournal article10.1021/acsphotonics.5c00526WOS:001510204200001SI