Panneerchelvam, PremPremPanneerchelvamAgarwal, AnkurAnkurAgarwalHuard, Chad M. M.Chad M. M.HuardPret, Alessandro VaglioAlessandro VaglioPretMani, AntonioAntonioManiGronheid, RoelRoelGronheidDemand, MarcMarcDemandKumar, KaushikKaushikKumarPaolillo, SaraSaraPaolilloLazzarino, FredericFredericLazzarino2022-11-102022-10-092022-11-1020222166-2746WOS:000862353600001https://imec-publications.be/handle/20.500.12860/40543Evolution of lithography-to-etch bias in multi-patterning processesJournal article10.1116/6.0002059WOS:000862353600001SILICON DIOXIDEPLASMAMECHANISMSIO2