A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps

Gomes dos Santos Filho, S.S.Gomes dos Santos FilhoHasenack, ClausClausHasenackSalay, L. C.L. C.SalayMertens, PaulPaulMertens2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/660A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final stepsJournal article