Contribution of mask defectivity in stochastics of EUVL-based wafer printing

Melvin, Lawrence S., IIILawrence S., IIIMelvinJonckheere, RikRikJonckheere2022-03-042022-03-0420211932-5150WOS:000670414000005https://imec-publications.be/handle/20.500.12860/39297Contribution of mask defectivity in stochastics of EUVL-based wafer printingJournal article10.1117/1.JMM.20.2.021003WOS:000670414000005