0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

Tritchkov, AlexanderAlexanderTritchkovStirnimann, J.J.StirnimannGangala, Hareen KHareen KGangalaRonse, KurtKurtRonse2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/30030.18 μm KrF lithography using optical proximity correction based on empirical behavior modelingJournal article