Properties and dynamic behavior of electron traps in HfO2/SiO2 stacks

Zhao, C.Z.C.Z.ZhaoZahid, MohammedMohammedZahidZhang, JohnJohnZhangGroeseneken, GuidoGuidoGroesenekenDegraeve, RobinRobinDegraeveDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162005-06https://imec-publications.be/handle/20.500.12860/11606Properties and dynamic behavior of electron traps in HfO2/SiO2 stacksJournal article