Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes

Li, JieJieLiChae, HeeyeopHeeyeopChae2023-11-232023-06-112023-11-2320230256-1115WOS:000991735300001https://imec-publications.be/handle/20.500.12860/41706Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processesJournal article review10.1007/s11814-023-1443-xWOS:000991735300001C-H FILMSCAPACITIVELY-COUPLED PLASMASHARD MASKSUBSTRATE-TEMPERATUREOPTICAL-PROPERTIESGROWTHPECVDLAYERRATIO