Ronse, KurtKurtRonseCheng, ShauneeShauneeChengErcken, MoniqueMoniqueErckenLeunissen, PeterPeterLeunissenMaenhoudt, MireilleMireilleMaenhoudtVandenberghe, GeertGeertVandenberghe2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11121Progress in ArF immersion lithographyProceedings paper