Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation

Collart, E.H.E.H.CollartFelch, S.B.S.B.FelchGraoui, H.H.GraouiKirkwood, D.D.KirkwoodPawlak, BartekBartekPawlakAbsil, PhilippePhilippeAbsilSeveri, SimoneSimoneSeveriJanssens, TomTomJanssensVandervorst, WilfriedWilfriedVandervorst2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10248Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formationProceedings paper