Jonckheere, RikRikJonckheereIwamoto, FumioFumioIwamotoLorusso, GianGianLorussoGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonse2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12366Mask defect printability in full field EUV lithographyProceedings paper