Detavernier, C.C.DetavernierVan Meirhaeghe, R. L.R. L.Van MeirhaegheCardon, F.F.CardonMaex, KarenKarenMaexBender, HugoHugoBenderBrijs, BertBertBrijsVandervorst, WilfriedWilfriedVandervorst2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5249Formation of epitaxial CoSi2 by a Cr or Mo interlayer: comparison with a Ti interlayerJournal article