De Simone, DaniloDaniloDe SimoneMao, MingMingMaoLazzarino, FredericFredericLazzarinoVandenberghe, GeertGeertVandenberghe2021-10-232021-10-2320160914-9244https://imec-publications.be/handle/20.500.12860/26512Metal containing resist readiness for HVM EUV lithographyJournal articlehttps://www.jstage.jst.go.jp/article/photopolymer/29/3/29_501/_article