Electrical assessment of gate oxide punchthrough in advanced polysilicon high density plasma etch.

Van den Bosch, GeertGeertVan den BoschBeckx, StephanStephanBeckxDupas, LucLucDupasVanhaelemeersch, SergeSergeVanhaelemeerschDeferm, LudoLudoDeferm2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3912Electrical assessment of gate oxide punchthrough in advanced polysilicon high density plasma etch.Proceedings paper