Simultaneous optimization of the material properties, uniformity and deposition rate of polycrystalline CVD And PECVD silicon-germanium layers for MEMS applications

Bryce, GeorgeGeorgeBryceSeveri, SimoneSimoneSeveriDu Bois, BertBertDu BoisWillegems, MyriamMyriamWillegemsClaes, GertGertClaesVan Hoof, RitaRitaVan HoofHaspeslagh, LucLucHaspeslaghDecoutere, StefaanStefaanDecoutereWitvrouw, AnnAnnWitvrouw2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13465Simultaneous optimization of the material properties, uniformity and deposition rate of polycrystalline CVD And PECVD silicon-germanium layers for MEMS applicationsMeeting abstract