Shamiryan, DenisDenisShamiryanParaschiv, VasileVasileParaschivLocorotondo, SabrinaSabrinaLocorotondoBeckx, StephanStephanBeckxBoullart, WernerWernerBoullartVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11193Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gatesJournal article