300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Clerix, Jan-WillemJan-WillemClerixWarad, L.L.WaradHung, J.J.HungHody, HubertHubertHodyVan Roey, FriedaFriedaVan RoeyLorusso, GianGianLorussoKoret, R.R.KoretLee, W. T.W. T.LeeShah, K.K.ShahDelabie, AnneliesAnneliesDelabie2023-07-122023-05-222023-07-1220230169-4332WOS:000984767300001https://imec-publications.be/handle/20.500.12860/41611300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer depositionJournal article10.1016/j.apsusc.2023.157222WOS:000984767300001NEXT-GENERATIONSIZENANOPARTICLES