Ercken, MoniqueMoniqueErckenMoelants, MyriamMyriamMoelantsVandenberghe, GeertGeertVandenbergheGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseMasuda, SeiyaSeiyaMasudaSpiess, WalterWalterSpiessPawlowski, G.G.Pawlowski2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3450Optimization of an advanced positive DUV photoresist towards 150 nm and beyondOral presentation