Vandenberghe, GeertGeertVandenbergheKim, Young-ChangYoung-ChangKimDelvaux, ChristieChristieDelvauxLucas, KevinKevinLucasChoi, Sang-JunSang-JunChoiErcken, MoniqueMoniqueErckenRonse, KurtKurtRonseVleeming, BertBertVleeming2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5768ArF lithography options for 100nm technologiesJournal article