High throughput grating qualification of directed self-assembly patterns using optical metrology

Van Look, LieveLieveVan LookRincon Delgadillo, PaulinaPaulinaRincon DelgadilloLee, Yu-tsungYu-tsungLeePollentier, IvanIvanPollentierGronheid, RoelRoelGronheidCao, YiYiCaoLin, GuanyangGuanyangLinNealey, Paul F.Paul F.Nealey2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23264High throughput grating qualification of directed self-assembly patterns using optical metrologyOral presentation