Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition

Adelmann, ChristophChristophAdelmannLehnen, PeerPeerLehnenVan Elshocht, SvenSvenVan ElshochtZhao, ChaoChaoZhaoBrijs, BertBertBrijsFranquet, AlexisAlexisFranquetConard, ThierryThierryConardRoeckerath, MartinMartinRoeckerathSchubert, JurgenJurgenSchubertBoissiere, OlivierOlivierBoissiereLohe, ChristophChristophLoheDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162007-10https://imec-publications.be/handle/20.500.12860/11621Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor depositionJournal articlehttp://www3.interscience.wiley.com/cgi-bin/abstract/116329943/ABSTRACT