Hikavyy, AndriyAndriyHikavyyRooyackers, RitaRitaRooyackersVerheyen, PeterPeterVerheyenLeys, FrederikFrederikLeysVellianitis, GeorgiosGeorgiosVellianitisVan Dal, MarkMarkVan DalLander, RobRobLanderLoo, RogerRogerLoo2021-10-172021-10-172008-05https://imec-publications.be/handle/20.500.12860/13880Application of HCl gas phase etch in the production of novel devicesProceedings paper