Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric

Van Elshocht, SvenSvenVan ElshochtWeber, U.U.WeberConard, ThierryThierryConardKaushik, VidyaVidyaKaushikHoussa, MichelMichelHoussaHyun, SangjinSangjinHyunSeitzinger, BernardBernardSeitzingerLehnen, PeerPeerLehnenSchuhmacher, M.M.SchuhmacherLindner, J.J.LindnerCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11392Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectricJournal article