Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers

Doise, JanJanDoiseMannaert, GeertGeertMannaertSuh, Hyo SeonHyo SeonSuhRincon Delgadillo, PaulinaPaulinaRincon DelgadilloVandenberghe, GeertGeertVandenbergheWillson, C. GrantC. GrantWillsonEllison, Christopher J.Christopher J.Ellison2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30650Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymersProceedings paper