Selective wet etching of Hf-based layers on a single-wafer spin processor

Kraus, HaraldHaraldKrausKovacs, F.F.KovacsSnow, JimJimSnowClaes, MartineMartineClaesParaschiv, VasileVasileParaschivVos, RitaRitaVosMertens, PaulPaulMertensDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9146Selective wet etching of Hf-based layers on a single-wafer spin processorProceedings paper