Delabie, AnneliesAnneliesDelabieCarbajal, DiegoDiegoCarbajalSoethoudt, JobJobSoethoudtChan, BTBTChanAltamirano Sanchez, EfrainEfrainAltamirano SanchezMeynaerts, BenBenMeynaertsClerix, Jan-WillemJan-WillemClerixVan Elshocht, SvenSvenVan Elshocht2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32858From surface dependence in atomic layer deposition to area-selective deposition of TiNMeeting abstract