Influence of tin impurities on the generation and annealing of thermal oxygen donors in Czochralski silicon at 450 degrees C

Neimash, V. B.V. B.NeimashKraitchinskii, A.A.KraitchinskiiKras'ko, M.M.Kras'koPuzenko, O.O.PuzenkoClaeys, CorCorClaeysSimoen, EddyEddySimoenSvensson, B.B.SvenssonKuznetsov, A.A.Kuznetsov2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4609Influence of tin impurities on the generation and annealing of thermal oxygen donors in Czochralski silicon at 450 degrees CJournal article