Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs

You, ShuzhenShuzhenYouVan Huylenbroeck, StefaanStefaanVan HuylenbroeckNguyen, DuyDuyNguyenSibaja-Hernandez, ArturoArturoSibaja-HernandezVenegas, RafaelRafaelVenegasVan Wichelen, KoenKoenVan WichelenDecoutere, StefaanStefaanDecoutereDe Meyer, KristinKristinDe Meyer2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16590Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTsMeeting abstract