Synchrotron measurement of the effect of dielectric porosity and air gaps on the stress in advanced Cu/low-k interconnects

Wilson, ChrisChrisWilsonZhao, ChaoChaoZhaoZhao, LarryLarryZhaoTokei, ZsoltZsoltTokeiCroes, KristofKristofCroesPantouvaki, MariannaMariannaPantouvakiBeyer, GeraldGeraldBeyerHorsfall, AAHorsfallO'Neill, AAO'Neill2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16550Synchrotron measurement of the effect of dielectric porosity and air gaps on the stress in advanced Cu/low-k interconnectsProceedings paper