Automated OPC for application in advanced lithography

Ronse, KurtKurtRonseTritchkov, AlexanderAlexanderTritchkovRandall, JohnJohnRandallJonckheere, RikRikJonckheereGhandehari, KourosKourosGhandehariVan den hove, LucLucVan den hove2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/2108Automated OPC for application in advanced lithographyProceedings paper