Pollentier, IvanIvanPollentierMaenhoudt, MireilleMireilleMaenhoudtWiaux, VincentVincentWiauxVangoidsenhoven, DizianaDizianaVangoidsenhovenRonse, KurtKurtRonse2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4665Dual damascene back-end patterning using 248nm and 193nm lithographyProceedings paper