Pollentier, IvanIvanPollentierIwamoto, FumioFumioIwamotoKocsis, MichaelMichaelKocsisSomanchi, AnoopAnoopSomanchiBurkeen, FrankFrankBurkeenVedula, SrinivasSrinivasVedula2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12723Innovative metrology for wafer edge defectivity in immersion lithographyProceedings paper