Investigation of metallic contamination analysis using vapor phase decomposition – droplet collection – total reflection X-ray fluorescence (VPD-DC-TXRF) for Pt-group elements on silicon wafers

Hellin, DavidDavidHellinValckx, NickNickValckxRip, JensJensRipDe Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckier2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13851Investigation of metallic contamination analysis using vapor phase decomposition – droplet collection – total reflection X-ray fluorescence (VPD-DC-TXRF) for Pt-group elements on silicon wafersProceedings paper