Integration of low and high temperature junction anneals for 45nm CMOS

Lindsay, RichardRichardLindsayPawlak, BartekBartekPawlakHenson, KirklenKirklenHensonSatta, AlessandraAlessandraSattaSeveri, SimoneSimoneSeveriLauwers, AnneAnneLauwersSurdeanu, RaduRaduSurdeanuMcCoy, S.S.McCoyGelpey, J.J.GelpeyPagès, XavierXavierPagèsMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9206Integration of low and high temperature junction anneals for 45nm CMOSProceedings paper