Philipsen, VickyVickyPhilipsenBekaert, JoostJoostBekaertVandenberghe, GeertGeertVandenbergheJonckheere, RikRikJonckheereVan Den Broecke, D.D.Van Den BroeckeSocha, R.R.Socha2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9423Mask topography effect in chromeless phase lithographyProceedings paper