Etch challenges of a spin-on trilayer resist system for narrow pitch dual damascene patterning

Lazzarino, FredericFredericLazzarinoWilson, ChrisChrisWilsonTruffert, VincentVincentTruffertVereecke, BartBartVereeckeDemuynck, StevenStevenDemuynckde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanov2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20988Etch challenges of a spin-on trilayer resist system for narrow pitch dual damascene patterningMeeting abstract