Vanelderen, PieterPieterVanelderenVandenbroeck, NadiaNadiaVandenbroeckLiang, Y.C.Y.C.LiangVan Driessche, VeerleVeerleVan DriesscheGuerrero, DouglasDouglasGuerreroChacko, A.A.ChackoDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenberghe2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/36204Underlayer optimization method for EUV lithographyProceedings paper10.1117/12.2551684